A bi-directional multi-aperture planar coaxial applicator for low-power microwave hyperthermia

Dongki Kim, Kihyun Kim, Jungmin Oh, Changyul Cheon, Youngwoo Kwon

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

Abstract

A bi-directional planar coaxial applicator with multiple apertures is presented in this paper. The applicator is optimized for uniform thermal distribution over large volume for low-power microwave hyperthermia. The proposed applicator can radiate microwaves in both up and down directions simultaneously, resulting in extended treatment volume. The power distribution into each aperture has been optimized to achieve uniform thermal profile by solving the bioheat equation. 3-D thermal profiles are measured on the surface of 4 mm-thick pork muscle using Infra-Red microscope from three orthogonal directions. The measured thermal profile confirms uniform thermal distribution and expanded heating volume.

Original languageEnglish
Title of host publicationIMS 2009 - 2009 IEEE MTT-S International Microwave Symposium Digest
Pages1689-1692
Number of pages4
DOIs
StatePublished - 2009
Event2009 IEEE MTT-S International Microwave Symposium, IMS 2009 - Boston, MA, United States
Duration: 7 Jun 200912 Jun 2009

Publication series

NameIEEE MTT-S International Microwave Symposium Digest
ISSN (Print)0149-645X

Conference

Conference2009 IEEE MTT-S International Microwave Symposium, IMS 2009
Country/TerritoryUnited States
CityBoston, MA
Period7/06/0912/06/09

Keywords

  • Hyperthermia
  • Multi-aperture applicator
  • Planar coaxial
  • Thermal distribution

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