A fully performance compatible 45 nm 4-gigabit three dimensional double-stacked multi-level NAND flash memory with shared bit-line structure

A 3-dimensional double stacked 4 Giga-bit multi-level cell NAND flash memory device with shared bitline structure have successfully developed. The device is fabricated by 45 nm floating-gate CMOS and single-crystal Si layer stacking technologies. To support fully compatible device performance and characteristics with conventional planar device, shared bitline architecture including Si layer-dedicated decoder and Si layer-compensated control schemes are also developed. By using the architecture and the design techniques, a memory cell size of 0.0021 $μ{m}}{2}{bit}$ per unit feature area which is smallest cell size and 2.5 MB/s program throughput with 2 kB page size which is almost equivalent performance compared to conventional planar device are realized.