Abstract
In this study, a nonvolatile memory (NVM) device of novel structure in three-dimension is introduced and validated. It is based on a pillar structure where two memory nodes commonly reside. The storage nodes are controlled by a single control gate so that spaces between silicon pillars can be reduced, in which additional gates called cutoff gates realize perfect operations. Gated twin-bit (GTB) NVM device is considered as the ultimate form of 3-D NVM device based on double-gate structure in a sense that the use of common gate makes maximal integration possible. The operation schemes and fabrication method of the GTB NVM device are also introduced.
Original language | English |
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Article number | 4810110 |
Pages (from-to) | 595-602 |
Number of pages | 8 |
Journal | IEEE Transactions on Nanotechnology |
Volume | 8 |
Issue number | 5 |
DOIs | |
State | Published - Sep 2009 |
Keywords
- 3-D nonvolatile memory (NVM) device
- Cutoff gate
- Double-gate structure
- Gated twin-bit (GTB)
- Pillar structure