@inproceedings{899f5b4e4a344580831cab17277c7b66,
title = "Actinic EUV mask inspection using coherent EUV source based on high-order harmonic generation",
abstract = "We developed a coherent scattering microscope (CSM) for actinic EUV mask inspection. The CSM system was designed to measure critical dimensions down to 88 nm, and 200 nm l/s patterns were experimentally inspected.",
keywords = "Coherent scattering microscope, EUV mask inspection, High-order harmonic generation",
author = "Kim, \{Yong Soo\} and June Park and Park, \{Han Yong\} and Hamin Sung and Jomsool Kim and \{Beom Lee\}, Seung and Cho, \{Hyun Woo\} and Lee, \{Ju Han\} and Park, \{Min Chul\} and Jhon, \{Young Min\}",
note = "Publisher Copyright: {\textcopyright} 2015 IEEE.; 11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015 ; Conference date: 24-08-2015 Through 28-08-2015",
year = "2016",
month = jan,
day = "7",
doi = "10.1109/CLEOPR.2015.7376009",
language = "English",
series = "2015 11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
booktitle = "2015 11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015",
address = "United States",
}