TY - JOUR
T1 - Advanced Hybrid Positioning System of SEM and AFM for 2D Material Surface Metrology
AU - Kim, Taeryong
AU - Kim, Donghwan
AU - Kim, Tae Wan
AU - Kim, Hyunwoo
AU - Shin, Chae Ho
N1 - Publisher Copyright:
© 2022 The Author(s). Published by Cambridge University Press on behalf of the Microscopy Society of America.
PY - 2022/10/23
Y1 - 2022/10/23
N2 - As the measurement scale shrinks, the reliability of nanoscale measurement is even more crucial for a variety of applications, including semiconductor electronics, optical metamaterials, and sensors. Specifically, it is difficult to measure the nanoscale morphology at the exact location though it is required for novel applications based on hybrid nanostructures combined with 2D materials. Here, we introduce an advanced hybrid positioning system to measure the region of interest with enhanced speed and high precision. A 5-axis positioning stage (XYZ, R, gripper) makes it possible to align the sample within a 10-m field of view (FOV) in both the scanning electron microscope (SEM) and the atomic force microscope (AFM). The reproducibility of the sample position was investigated by comparing marker patterns and denting points between the SEM and AFM, revealing an accuracy of 6.5 ± 2.1 m for the x-axis and 4.5 ± 1.7 m for the y-axis after 12 repetitions. By applying a different measurement process according to the characteristics of 2D materials, various information such as height, length, or roughness about MoTe2 rods and MoS2 film was obtained in the same measurement area. As a consequence, overlaid two images can be obtained for detailed information about 2D materials.
AB - As the measurement scale shrinks, the reliability of nanoscale measurement is even more crucial for a variety of applications, including semiconductor electronics, optical metamaterials, and sensors. Specifically, it is difficult to measure the nanoscale morphology at the exact location though it is required for novel applications based on hybrid nanostructures combined with 2D materials. Here, we introduce an advanced hybrid positioning system to measure the region of interest with enhanced speed and high precision. A 5-axis positioning stage (XYZ, R, gripper) makes it possible to align the sample within a 10-m field of view (FOV) in both the scanning electron microscope (SEM) and the atomic force microscope (AFM). The reproducibility of the sample position was investigated by comparing marker patterns and denting points between the SEM and AFM, revealing an accuracy of 6.5 ± 2.1 m for the x-axis and 4.5 ± 1.7 m for the y-axis after 12 repetitions. By applying a different measurement process according to the characteristics of 2D materials, various information such as height, length, or roughness about MoTe2 rods and MoS2 film was obtained in the same measurement area. As a consequence, overlaid two images can be obtained for detailed information about 2D materials.
KW - 5-axis positioning system
KW - MoS
KW - MoTe
KW - atomic force microscopy
KW - overlay image
KW - scanning electron microscopy
UR - http://www.scopus.com/inward/record.url?scp=85139391410&partnerID=8YFLogxK
U2 - 10.1017/S1431927622000903
DO - 10.1017/S1431927622000903
M3 - Article
AN - SCOPUS:85139391410
SN - 1431-9276
VL - 28
SP - 1604
EP - 1610
JO - Microscopy and Microanalysis
JF - Microscopy and Microanalysis
IS - 5
ER -