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Amorphous silicon film deposition by low temperature catalytic chemical vapor deposition (<150°C) and laser crystallization for polycrystalline silicon thin-film transistor application

  • Sung Hyun Lee
  • , Wan Shick Hong
  • , Jong Man Kim
  • , Hyuck Lim
  • , Kuyng Bae Park
  • , Chul Lae Cho
  • , Kyung Eun Lee
  • , Do Young Kim
  • , Ji Sim Jung
  • , Jang Yeon Kwon
  • , Takashi Noguchi
  • Sejong University
  • Samsung

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

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