Abstract
We propose an accurate compact model of nand Flash memory, which is fully compatible with a BSIM-4 model. In sub-30-nm nand Flash, adjacent cells directly affect the channel-edge potential of the selected cell. Due to such direct-channel interference, previous compact models cannot accurately simulate the characteristics of sub-30-nm nand strings. In this letter, we describe the interference as the threshold voltage variation due to adjacent cells and change the threshold voltage equation of the BSIM-4 model. The equation is semitheoretically derived. Using the proposed model, we simulated several behaviors of 27-nm nand Flash strings. The results show more than 90% accuracy compared with the silicon measurements.
Original language | English |
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Article number | 6220235 |
Pages (from-to) | 1114-1116 |
Number of pages | 3 |
Journal | IEEE Electron Device Letters |
Volume | 33 |
Issue number | 8 |
DOIs | |
State | Published - 2012 |
Keywords
- Cell-to-cell interferences
- compact model
- direct field effect
- nand Flash
- nand string