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Analysis of Multiple Fin-type Vertical GaN Power Transistors based on Bulk GaN Substrates

  • Jun Hyeok Heo
  • , Sang Ho Lee
  • , Jin Park
  • , So Ra Min
  • , Geon Uk Kim
  • , Ga Eon Kang
  • , Jaewon Jang
  • , Jin Hyuk Bae
  • , Sin Hyung Lee
  • , In Man Kang
  • Kyungpook National University

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

—In this study, the multiple fin-type vertical GaN power transistor based on the GaN-on-GaN were analyzed using the two-dimensional technical computer-aided design (2-D TCAD) simulations. In the field of the electric vehicle systems requiring a high operation voltage of 1,000 V or more, the power devices have a large device area because of the long distance between the gate region and the drain region. This problem can be addressed by using the fin-type vertical GaN power transistor, which can reduce the device area due to its vertical channel. For the high current performance, the multiple fin-type structure was required. Thus, we investigated characteristics depending on the number of fin (Nfin). By comparing the on-state drain currents (Ion), the breakdown voltages (BV), and the on-resistances (Ron) with different Nfin, this study provides an understanding of the electrical properties of the multiple fin-type vertical GaN power transistor affected by Nfin.

Original languageEnglish
Pages (from-to)17-25
Number of pages9
JournalJournal of Semiconductor Technology and Science
Volume23
Issue number1
DOIs
StatePublished - Feb 2023

Keywords

  • Gallium nitride (GaN)
  • fin structure
  • power device
  • vertical device

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