Analysis on Self-Heating Effects in Three-Stacked Nanoplate FET

Hyunsuk Kim, Dokyun Son, Ilho Myeong, Myounggon Kang, Jongwook Jeon, Hyungcheol Shin

Research output: Contribution to journalArticlepeer-review

25 Scopus citations

Abstract

In this paper, self-heating effects (SHEs) in three-stacked nanoplate FETs were investigated through the TCAD simulation. In order to obtain high reliability, the evaluation of SHEs was performed after ID - VG curve fitting based on the experimental data. First, general analysis on SHEs was conducted to confirm the influence of SHEs to electrical characteristics. The optimized nanoplate width for great electrical properties was proposed by using the figure-of-merit factor under the consideration of SHEs. In addition, difference of heat flux between FinFET and stacked nanoplate FET was analyzed. Based on the analysis, the two-step thermal resistance (Rth) model depending on drain voltage was proposed. The two-step Rth model in the stacked nanoplate FET matched well with the Berkeley short-channel IGFET model - common multigate model compared the other Rth models. A seven-stage ring oscillator with the proposed Rth model was demonstrated, and SHEs in the circuit level were confirmed.

Original languageEnglish
Article number8449097
Pages (from-to)4520-4526
Number of pages7
JournalIEEE Transactions on Electron Devices
Volume65
Issue number10
DOIs
StatePublished - Oct 2018

Keywords

  • Berkeley short-channel IGFET model-common multigate (BSIM CMG) modeling
  • self-heating effect (SHE)
  • stacked nanoplate FET
  • thermal conductivity
  • thermal resistance (R)

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