Application of the LIGA process for fabrication of gas avalanche devices

H. K. Kim; K. Jackson; W. S. Hong; I. J. Park; S. H. Han; J. Kadyk; V. Perez-Mendez; W. Wenzel; G. Cho

doi:10.1109/23.856719

Application of the LIGA process for fabrication of gas avalanche devices

H. K. Kim, K. Jackson, W. S. Hong, I. J. Park, S. H. Han, J. Kadyk, V. Perez-Mendez, W. Wenzel, G. Cho

Department of Materials Science and Engineering

Lawrence Berkeley National Laboratory

Research output: Contribution to journal › Conference article › peer-review

8 Scopus citations

Abstract

Arrays of holes having steep wall sides have been successfully prepared by using a deep X-ray lithography technique, or LIGA process, on various thicknesses (50 - 1,000 μm) polymethylmethacrylate (PMMA) plastic sheets. Electrical contact layers onto the top and bottom sides were deposited by metal evaporation in a vacuum. The completed LIGA devices were studied as an alternative design of the gas electron multiplier (GEM). The first measurements of performance were very promising: a lower limit to the avalanche gain of approx. 3,000 was obtained, and the actual gain is probably much larger. Detailed experimental results and field simulations will be described in this study. In addition, an application of a LIGA device to serve as a drift plane electrode, avoiding the angle dependency, will be discussed.

Original language	English
Pages (from-to)	923-927
Number of pages	5
Journal	IEEE Transactions on Nuclear Science
Volume	47
Issue number	3 II
DOIs	https://doi.org/10.1109/23.856719
State	Published - 2000
Event	The 1999 Nuclear Science Symposium (NEC) - Seattle, WA, USA Duration: 26 Oct 1999 → 28 Oct 1999

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title = "Application of the LIGA process for fabrication of gas avalanche devices",

abstract = "Arrays of holes having steep wall sides have been successfully prepared by using a deep X-ray lithography technique, or LIGA process, on various thicknesses (50 - 1,000 μm) polymethylmethacrylate (PMMA) plastic sheets. Electrical contact layers onto the top and bottom sides were deposited by metal evaporation in a vacuum. The completed LIGA devices were studied as an alternative design of the gas electron multiplier (GEM). The first measurements of performance were very promising: a lower limit to the avalanche gain of approx. 3,000 was obtained, and the actual gain is probably much larger. Detailed experimental results and field simulations will be described in this study. In addition, an application of a LIGA device to serve as a drift plane electrode, avoiding the angle dependency, will be discussed.",

author = "Kim, {H. K.} and K. Jackson and Hong, {W. S.} and Park, {I. J.} and Han, {S. H.} and J. Kadyk and V. Perez-Mendez and W. Wenzel and G. Cho",

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journal = "IEEE Transactions on Nuclear Science",

issn = "0018-9499",

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number = "3 II",

note = "The 1999 Nuclear Science Symposium (NEC) ; Conference date: 26-10-1999 Through 28-10-1999",

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TY - JOUR

T1 - Application of the LIGA process for fabrication of gas avalanche devices

AU - Kim, H. K.

AU - Jackson, K.

AU - Hong, W. S.

AU - Park, I. J.

AU - Han, S. H.

AU - Kadyk, J.

AU - Perez-Mendez, V.

AU - Wenzel, W.

AU - Cho, G.

PY - 2000

Y1 - 2000

N2 - Arrays of holes having steep wall sides have been successfully prepared by using a deep X-ray lithography technique, or LIGA process, on various thicknesses (50 - 1,000 μm) polymethylmethacrylate (PMMA) plastic sheets. Electrical contact layers onto the top and bottom sides were deposited by metal evaporation in a vacuum. The completed LIGA devices were studied as an alternative design of the gas electron multiplier (GEM). The first measurements of performance were very promising: a lower limit to the avalanche gain of approx. 3,000 was obtained, and the actual gain is probably much larger. Detailed experimental results and field simulations will be described in this study. In addition, an application of a LIGA device to serve as a drift plane electrode, avoiding the angle dependency, will be discussed.

AB - Arrays of holes having steep wall sides have been successfully prepared by using a deep X-ray lithography technique, or LIGA process, on various thicknesses (50 - 1,000 μm) polymethylmethacrylate (PMMA) plastic sheets. Electrical contact layers onto the top and bottom sides were deposited by metal evaporation in a vacuum. The completed LIGA devices were studied as an alternative design of the gas electron multiplier (GEM). The first measurements of performance were very promising: a lower limit to the avalanche gain of approx. 3,000 was obtained, and the actual gain is probably much larger. Detailed experimental results and field simulations will be described in this study. In addition, an application of a LIGA device to serve as a drift plane electrode, avoiding the angle dependency, will be discussed.

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SN - 0018-9499

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JO - IEEE Transactions on Nuclear Science

JF - IEEE Transactions on Nuclear Science

IS - 3 II

T2 - The 1999 Nuclear Science Symposium (NEC)

Y2 - 26 October 1999 through 28 October 1999

ER -

Application of the LIGA process for fabrication of gas avalanche devices

Abstract

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