Atomic structure of Cs grown on Si(001)(2 × 1) surface by coaxial impact collision ion scattering spectroscopy

  • J. Y. Kim
  • , J. Y. Park
  • , J. H. Seo
  • , C. N. Whang
  • , S. S. Kim
  • , D. S. Choi
  • , H. J. Kang
  • , K. H. Chae

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

The atomic structure and the saturation coverage of Cs on the Si(0 0 1)(2 × 1) surface at room temperature have been studied by coaxial impact collision ion scattering spectroscopy (CAICISS). For the atomic structure of saturated Cs/Si(0 0 1)(2 -xt 1) surface, it is found that Cs atoms occupy a single adsorption site at T3 on the Si(0 0 1) surface. The height of Cs atoms adsorbed at T3 site is 3:18 ± 0:05 Å from the second layer of Si(0 0 1)(2 × 1) surface. The saturation coverage estimated from the measured CAICISS intensity ratio and the proposed atomic structure is found to be 0:46 × 0:06 ML.

Original languageEnglish
Pages (from-to)83-88
Number of pages6
JournalCurrent Applied Physics
Volume3
Issue number1
DOIs
StatePublished - Feb 2003

Keywords

  • Cesium
  • Low energy ion scattering
  • Silicon
  • Surface structure

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