Atomic structure of Cs layer grown on Si(0 0 1)(2 × 1) surface at room temperature

  • J. Y. Kim
  • , J. Y. Park
  • , J. H. Seo
  • , C. N. Whang
  • , H. J. Kang
  • , S. S. Kim
  • , D. S. Choi
  • , K. H. Chae

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

The atomic structure of Cs layer grown on Si(0 0 1)(2×1) surface at room temperature was investigated by using coaxial impact collision ion scattering spectroscopy. The Cs atoms was found to occupy a single absorption site with a height of 3.18±0.05 Å from the second layer of Si(0 0 1) surface. The results showed that the bond length between Cs and the nearest Si atoms was 3.71 ± 0.05 Å.

Original languageEnglish
Pages (from-to)L340-L346
JournalSurface Science
Volume531
Issue number1
DOIs
StatePublished - 10 May 2003

Keywords

  • Alkali metals
  • Low energy ion scattering (LEIS)
  • Silicon
  • Surface structure, morphology, roughness, and topography

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