Characteristics of silicon nanocrystals embedded in the silicon nitride films deposited by PE-CVD at a low temperature
- Jae Dam Hwang
- , Ki Su Keum
- , Youn Jin Lee
- , Kyoung Min Lee
- , Seunghun Jang
- , Moonsup Han
- , Wan Shick Hong
Research output: Contribution to conference › Paper › peer-review