Skip to main navigation Skip to search Skip to main content

Characteristics of silicon nitride films deposited by cat-CVD at a low temperature (100 °)

  • Tae Ho Songa
  • , Ki Su Keuma
  • , Sin Young Kanga
  • , Jung Hoon Parka
  • , Wan Shick Hong
  • University of Seoul

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Fingerprint

Dive into the research topics of 'Characteristics of silicon nitride films deposited by cat-CVD at a low temperature (100 °)'. Together they form a unique fingerprint.
Sort by

Engineering

Material Science