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Characteristiscs of nanocrystalline silicon films deposited by cat-CVD below 100 °

  • Tae Ho Song
  • , Ki Su Keum
  • , Sin Young Kang
  • , Jung Hoon Park
  • , Jin Hoon Kim
  • , Wan Shick Hong
  • University of Seoul

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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