Correlations between electrical properties and process parameters of silicon nitride films prepared by low temperature (100°C) catalytic CVD

Se Myoung Noh, Wan Shick Hong

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Fingerprint

Dive into the research topics of 'Correlations between electrical properties and process parameters of silicon nitride films prepared by low temperature (100°C) catalytic CVD'. Together they form a unique fingerprint.

Engineering

Material Science

Chemical Engineering