Abstract
By employing first-principles total-energy calculations we studied the atomic and chemical structure of NiSi2/Si(001) and CoSi2/Si(001) interfaces that are of great importance in under-standing electronic properties, such as the Schottky-barrier height, of metal-silicide/silicon junctions. We found a new structural model that is more stable than previously proposed models of interface structures and well explains existing experimental data. The new interface model consists of sevenfold-coordinated interfacial metals and a 2×1 periodic array of interfacial Si dimers, similar to the Si(001) 2×1 surface reconstruction, reducing the number of dangling bonds.
Original language | English |
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Pages (from-to) | 103-108 |
Number of pages | 6 |
Journal | Materials Research Society Symposium - Proceedings |
Volume | 564 |
DOIs | |
State | Published - 1999 |
Event | Proceedings of the 1999 MRS Spring Meeting - Symposium N: 'Advanced Interconnects and Contacts' - San Francisco, CA, United States Duration: 5 Apr 1999 → 7 Apr 1999 |