Direct deposition of silicon quantum dots embedded silicon nitride film on plastic substrate by catalytic CVD

K. M. Lee; T. H. Kim; J. D. Hwang; S. H. Jang; K. Y. Jeong; M. S. Han; W. S. Hong

Direct deposition of silicon quantum dots embedded silicon nitride film on plastic substrate by catalytic CVD

K. M. Lee, T. H. Kim, J. D. Hwang, S. H. Jang, K. Y. Jeong, M. S. Han, W. S. Hong

University of Seoul

Research output: Contribution to conference › Paper › peer-review

Abstract

We fabricated silicon quantum dots embedded in silicon nitride film using catalytic chemical vapor deposition process at a low temperature. Formation and size of silicon quantum dots in silicon nitride film were analyzed by photoluminescence (PL) spectroscopy. The peaks at 1.75 eV in PL spectra were observed in high H₂-dilution sample. Silicon quantum dots of 5 nm in this sample were confirmed by transmission electron microscopy.

Original language	English
Pages	939-940
Number of pages	2
State	Published - 2008
Event	15th International Display Workshops, IDW '08 - Niigata, Japan Duration: 3 Dec 2008 → 5 Dec 2008

Conference

Conference	15th International Display Workshops, IDW '08
Country/Territory	Japan
City	Niigata
Period	3/12/08 → 5/12/08

Cite this

@conference{e5388e034d7c4b699572ce5f41d858df,

title = "Direct deposition of silicon quantum dots embedded silicon nitride film on plastic substrate by catalytic CVD",

abstract = "We fabricated silicon quantum dots embedded in silicon nitride film using catalytic chemical vapor deposition process at a low temperature. Formation and size of silicon quantum dots in silicon nitride film were analyzed by photoluminescence (PL) spectroscopy. The peaks at 1.75 eV in PL spectra were observed in high H2-dilution sample. Silicon quantum dots of 5 nm in this sample were confirmed by transmission electron microscopy.",

author = "Lee, {K. M.} and Kim, {T. H.} and Hwang, {J. D.} and Jang, {S. H.} and Jeong, {K. Y.} and Han, {M. S.} and Hong, {W. S.}",

year = "2008",

language = "English",

pages = "939--940",

note = "15th International Display Workshops, IDW '08 ; Conference date: 03-12-2008 Through 05-12-2008",

}

TY - CONF

T1 - Direct deposition of silicon quantum dots embedded silicon nitride film on plastic substrate by catalytic CVD

AU - Lee, K. M.

AU - Kim, T. H.

AU - Hwang, J. D.

AU - Jang, S. H.

AU - Jeong, K. Y.

AU - Han, M. S.

AU - Hong, W. S.

PY - 2008

Y1 - 2008

N2 - We fabricated silicon quantum dots embedded in silicon nitride film using catalytic chemical vapor deposition process at a low temperature. Formation and size of silicon quantum dots in silicon nitride film were analyzed by photoluminescence (PL) spectroscopy. The peaks at 1.75 eV in PL spectra were observed in high H2-dilution sample. Silicon quantum dots of 5 nm in this sample were confirmed by transmission electron microscopy.

AB - We fabricated silicon quantum dots embedded in silicon nitride film using catalytic chemical vapor deposition process at a low temperature. Formation and size of silicon quantum dots in silicon nitride film were analyzed by photoluminescence (PL) spectroscopy. The peaks at 1.75 eV in PL spectra were observed in high H2-dilution sample. Silicon quantum dots of 5 nm in this sample were confirmed by transmission electron microscopy.

UR - http://www.scopus.com/inward/record.url?scp=77954097948&partnerID=8YFLogxK

M3 - Paper

AN - SCOPUS:77954097948

SP - 939

EP - 940

T2 - 15th International Display Workshops, IDW '08

Y2 - 3 December 2008 through 5 December 2008

ER -

Direct deposition of silicon quantum dots embedded silicon nitride film on plastic substrate by catalytic CVD

Abstract

Conference

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