Direct nanometer-scale patterning by the cantilever oscillation of an atomic force microscope

C. K. Hyon; S. C. Choi; S. W. Hwang; D. Ahn; Yong Kim; E. K. Kim

doi:10.1063/1.124351

Direct nanometer-scale patterning by the cantilever oscillation of an atomic force microscope

C. K. Hyon, S. C. Choi, S. W. Hwang, D. Ahn, Yong Kim, E. K. Kim

School of Electrical and Computer Engineering

Research output: Contribution to journal › Article › peer-review

54 Scopus citations

Abstract

A resistless nanostructure patterning technique using tip oscillation of an atomic force microscope (AFM) was systematically investigated. Commercial AFM cantilevers are used to successfully generate patterns as narrow as 10 nm on a GaAs surface, without further sharpening of the tips. Reliable patterns with fully controlled width and depth are achieved by adjusting the feedback gain and the scan speed. This process allows nanometer-scale patterning to be performed simply, and is well suited for nanodevice fabrication.

Original language	English
Pages (from-to)	292-294
Number of pages	3
Journal	Applied Physics Letters
Volume	75
Issue number	2
DOIs	https://doi.org/10.1063/1.124351
State	Published - 12 Jul 1999

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Direct nanometer-scale patterning by the cantilever oscillation of an atomic force microscope

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