@inproceedings{537bcdec52e3452184472dc6203a9a34,
title = "Effect of nitridation pretreatment on the electrical properties of low-temperature (100°C) silicon nitride films",
abstract = "Nitridation pretreatment with a mixture of NHa and N2 has been attempted to improve electrical properties of silicon nitride films deposited at 100°C. The nitridation process for 1 minute at the substrate temperature of 50{"}C reduced drastically the capacitance-voltage hysteresis window and the threshold voltage shift.",
keywords = "Catalytic cvd, Electrical property, Low-temperature, Nitridation, Silicon nitride",
author = "Noh, {Se Myoung} and Hong, {Wan Shick}",
note = "Publisher Copyright: {\textcopyright} 2016 The Society for Information Display.; 23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016 ; Conference date: 07-12-2016 Through 09-12-2016",
year = "2016",
language = "English",
series = "23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016",
publisher = "Society for Information Display",
pages = "1080--1081",
booktitle = "23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016",
}