@inproceedings{ae2bacd0a98941a9b07b6906931a61ac,
title = "Effect of nitridation pretreatment on the electrical properties of low-temperature (100°C) silicon nitride films",
abstract = "Nitridation pretreatment with a mixture of NH3 and N2 has been attempted to improve electrical properties of silicon nitride films deposited at 100°C. The nitridation process for 1 minute at the substrate temperature of 50°C reduced drastically the capacitance-voltage hysteresis window and the threshold voltage shift.",
keywords = "Catalytic cvd, Electrical property, Low-temperature, Nitridation, Silicon nitride",
author = "Noh, {Se Myoung} and Hong, {Wan Snick}",
note = "Publisher Copyright: {\textcopyright} 2016 Society for Information Display. All rights reserved.; 23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016 ; Conference date: 07-12-2016 Through 09-12-2016",
year = "2016",
language = "English",
series = "23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016",
publisher = "Society for Information Display",
pages = "114--115",
booktitle = "23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016",
}