Effective deposition of nanocrystalline silicon thin films at 200 °C by catalytic CVD

Tae Hwan Kim, Kyoung Min Lee, Jae Dam Hwang, Youn Jin Lee, Sunghwan Won, Junghyun Sok, Kyoungwan Park, Wan Shick Hong

Research output: Contribution to conferencePaperpeer-review

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