@article{072a731805774458b70d4ff88eb18556,
title = "Erratum: Recent advance in protection technology for extreme ultraviolet lithography masks under low-pressure condition (Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 26, L1 (2008))",
author = "Kim, \{Jung Hyeun\}",
year = "2008",
doi = "10.1116/1.2952482",
language = "English",
volume = "26",
pages = "1450",
journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
number = "4",
}