Evaluation of crack propagation at the interconnection interface induced by warpage of fan-out wafer-level-package

Ah Young Park, Jae Hak Lee, Jun Yeob Song, Seung Man Kim, Seongheum Han

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

6 Scopus citations

Abstract

This study is to evaluate crack propagation possibility at the interconnection interface of FOWLP induced by warpage. The strain energy release rate (SERR) around the region of interests was calculated using Finite element (FE) analysis. The estimated SERR was compared with the measured critical SERR to predict the risk of the crack propagation at the interface. Moreover, a parametric study was performed to analyze the sensitivity of design parameters to define the most critical one affects crack propagation. This study may give ideas of delamination at the interconnection interface and the main parameter results in the failure induced by warpage of FOWLP.

Original languageEnglish
Title of host publication2019 IEEE 21st Electronics Packaging Technology Conference, EPTC 2019
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages99-102
Number of pages4
ISBN (Electronic)9781728138350
DOIs
StatePublished - Dec 2019
Event21st IEEE Electronics Packaging Technology Conference, EPTC 2019 - Singapore, Singapore
Duration: 4 Dec 20196 Dec 2019

Publication series

Name2019 IEEE 21st Electronics Packaging Technology Conference, EPTC 2019

Conference

Conference21st IEEE Electronics Packaging Technology Conference, EPTC 2019
Country/TerritorySingapore
CitySingapore
Period4/12/196/12/19

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