Evaluation of protection schemes for extreme ultraviolet lithography (EUVL) masks against top-down aerosol flow
- Se Jin Yook
- , Heinz Fissan
- , Christof Asbach
- , Jung Hyeun Kim
- , Jing Wang
- , Pei Yang Yan
- , David Y.H. Pui
- University of Minnesota Twin Cities
- Institute of Energy and Environmental Technology e.V. (IUTA)
- Intel
Research output: Contribution to journal › Article › peer-review
35
Scopus
citations