Experimental demonstration of a ferroelectric FET using paper substrate

  • Changhwan Shin
  • , Gwang Geun Lee
  • , Dae Hee Han
  • , Seung Pil Han
  • , Eisuke Tokumitsu
  • , Shun Ichiro Ohmi
  • , Dong Joo Kim
  • , Hiroshi Ishiwara
  • , Minseo Park
  • , Seung Hyun Kim
  • , Wan Gyu Lee
  • , Yun Jeong Hwang
  • , Byung Eun Park

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

A ferroelectric field-effect transistor on a cellulose paper for nonvolatile memory application is fabricated by a low-cost solutionbased- only fabrication process. A ferroelectric material, poly(vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE)), is used to obtain a wide threshold voltage (VTH) window of ~20V for the transistor on paper. An on/off current ratio of ~102 is also obtained with a semiconducting channel material, Poly(3-hexylthiophene) (P3HT).

Original languageEnglish
Article number20140447
JournalIEICE Electronics Express
Volume11
Issue number14
DOIs
StatePublished - 4 Jul 2014

Keywords

  • Ferroelectric transistor
  • P(VDF-TRFE)
  • P3HT
  • Paper substrate

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