Fabrication and electrical characterization of lambda DNA field effect transistors

Jong Seung Hwang, Maeng Ho Son, Sung Woo Hwang, Doyeol Ahn

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We report fabrication and characterization of lambda DNA field effect transistors. Our transistor is basically a DNA network formed in between the source and the drain electrode on a SiO2/Si substrate. Measured source-drain current (ISD) as a function of the source-drain bias shows nonlinear characteristics. Such non-linearity is typically a manifestation of the semiconducting behavior and is believed to be caused by the energy gap of the DNA molecules. Our sample shows a field effect behavior and we observe that ISD increases as the gate bias becomes more negative. It suggests that the lambda DNA used in our experiment is a p-type molecule.

Original languageEnglish
Title of host publicationPhysics of Semiconductors - 28th International Conference on the Physics of Semiconductors, ICPS 2006, Part A and B
Pages359-360
Number of pages2
DOIs
StatePublished - 2007
Event28th International Conference on the Physics of Semiconductors, ICPS 2006 - Vienna, Austria
Duration: 24 Jul 200628 Jul 2006

Publication series

NameAIP Conference Proceedings
Volume893
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Conference

Conference28th International Conference on the Physics of Semiconductors, ICPS 2006
Country/TerritoryAustria
CityVienna
Period24/07/0628/07/06

Keywords

  • Field effect transistor
  • Lambda DNA
  • Molecules

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