Abstract
A type of 2-dimensional planar pattern with spatial resolution can be easily produced using scanning probe lithography (SPL). However, it has not been used successfully for fabricating 3-dimensional (3D) structures due to the low aspect ratio of the resulting structure. Herein, we describe a method for fabricating a 3D functionalized structure via a combination of SPL and self-assembly techniques. In this study, a 3D structure was established on a Si surface with a passivated monolayer via SPL. The patterned layer was modified using a w-functionalized organosilane. Lateral force microscopy (LFM) was applied to discriminate the chemical functionalities and gold nanoparticles were also used to clearly identify the modified layer.
| Original language | English |
|---|---|
| Pages (from-to) | 4161-4164 |
| Number of pages | 4 |
| Journal | Journal of Nanoscience and Nanotechnology |
| Volume | 7 |
| Issue number | 11 |
| DOIs | |
| State | Published - Nov 2007 |
Keywords
- 3D Structure
- AFM anodic oxidation
- Lateral force microscopy (LFM)
- Scanning probe lithography (SPL)
- Self-assembly