Fabrication of plasmonic arrays of nanodisks and nanotriangles by nanotip indentation lithography and their optical properties

Jongwoo Kim, Jeong Seop Lee, Ji Woong Kim, Peter De Wolf, Seunghyun Moon, Dong Hwan Kim, Joo Hyun Song, Jungwoo Kim, Taewan Kim, Sang Hwan Nam, Yung Doug Suh, Kyoung Ho Kim, Hyunwoo Kim, Chaeho Shin

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

Fabrication of plasmonic nanostructures in a precise and reliable manner is a topic of huge interest because their structural details significantly affect their plasmonic properties. Herein, we present nanotip indentation lithography (NTIL) based on atomic force microscopy (AFM) indentation for the patterning of plasmonic nanostructures with precisely controlled size and shape. The size of the nanostructures is controlled by varying the indentation force of AFM tips into the mask polymer; while their shapes are determined to be nanodisks (NDs) or nanotriangles (NTs) depending on the shapes of the AFM tip apex. The localized surface plasmon resonance of the NDs is tailored to cover most of the visible-wavelength regime by controlling their size. The NTs show distinct polarization-dependent plasmon modes consistent with full-wave optical simulations. For the demonstration of the light-matter interaction control capability of NTIL nanostructures, we show that photoluminescence enhancement from MoS2 layers can be deliberately controlled by tuning the size of the nanostructures. Our results pave the way for the AFM-indentation-based fabrication of plasmonic nanostructures with a highly precise size and shape controllability and reproducibility.

Original languageEnglish
Pages (from-to)4475-4484
Number of pages10
JournalNanoscale
Volume13
Issue number8
DOIs
StatePublished - 28 Feb 2021

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