Fabrication of SiO2/TiO2 double layer thin films with self-cleaning and photocatalytic properties

Hemraj M. Yadav; Jung Sik Kim

doi:10.1007/s10854-016-5082-4

Fabrication of SiO₂/TiO₂ double layer thin films with self-cleaning and photocatalytic properties

Hemraj M. Yadav, Jung Sik Kim

Department of Materials Science and Engineering

University of Seoul

Research output: Contribution to journal › Article › peer-review

17 Scopus citations

Abstract

Transparent antireflective SiO₂/TiO₂ double layer thin films were prepared using a sol–gel method and deposited on glass substrate by spin coating technique. Thin films were characterized using XRD, FE-SEM, AFM, UV–Vis spectroscopy and water contact angle measurements. XRD analysis reveals that the existence of pure anatase phase TiO₂ crystallites in the thin films. FE-SEM analysis confirms the homogeneous dispersion of TiO₂ on SiO₂ layer. Water contact angle on the thin films was measured by a contact angle analyzer under UV light irradiation. The photocatalytic performance of the TiO₂ and SiO₂/TiO₂ thin films was studied by the degradation of methylene blue under UV irradiation. The effect of an intermediate SiO₂ layer on the photocatalytic performance of TiO₂ thin films was examined. SiO₂/TiO₂ double layer thin films showed enhanced photocatalytic activity towards methylene blue dye.

Original language	English
Pages (from-to)	10082-10088
Number of pages	7
Journal	Journal of Materials Science: Materials in Electronics
Volume	27
Issue number	10
DOIs	https://doi.org/10.1007/s10854-016-5082-4
State	Published - 1 Oct 2016

Access to Document

10.1007/s10854-016-5082-4

Cite this

@article{9bd6a60141fb424096da20bb8ec27fac,

title = "Fabrication of SiO2/TiO2 double layer thin films with self-cleaning and photocatalytic properties",

abstract = "Transparent antireflective SiO2/TiO2 double layer thin films were prepared using a sol–gel method and deposited on glass substrate by spin coating technique. Thin films were characterized using XRD, FE-SEM, AFM, UV–Vis spectroscopy and water contact angle measurements. XRD analysis reveals that the existence of pure anatase phase TiO2 crystallites in the thin films. FE-SEM analysis confirms the homogeneous dispersion of TiO2 on SiO2 layer. Water contact angle on the thin films was measured by a contact angle analyzer under UV light irradiation. The photocatalytic performance of the TiO2 and SiO2/TiO2 thin films was studied by the degradation of methylene blue under UV irradiation. The effect of an intermediate SiO2 layer on the photocatalytic performance of TiO2 thin films was examined. SiO2/TiO2 double layer thin films showed enhanced photocatalytic activity towards methylene blue dye.",

author = "Yadav, {Hemraj M.} and Kim, {Jung Sik}",

note = "Publisher Copyright: {\textcopyright} 2016, Springer Science+Business Media New York.",

year = "2016",

month = oct,

day = "1",

doi = "10.1007/s10854-016-5082-4",

language = "English",

volume = "27",

pages = "10082--10088",

journal = "Journal of Materials Science: Materials in Electronics",

issn = "0957-4522",

publisher = "Springer New York",

number = "10",

}

TY - JOUR

T1 - Fabrication of SiO2/TiO2 double layer thin films with self-cleaning and photocatalytic properties

AU - Yadav, Hemraj M.

AU - Kim, Jung Sik

PY - 2016/10/1

Y1 - 2016/10/1

N2 - Transparent antireflective SiO2/TiO2 double layer thin films were prepared using a sol–gel method and deposited on glass substrate by spin coating technique. Thin films were characterized using XRD, FE-SEM, AFM, UV–Vis spectroscopy and water contact angle measurements. XRD analysis reveals that the existence of pure anatase phase TiO2 crystallites in the thin films. FE-SEM analysis confirms the homogeneous dispersion of TiO2 on SiO2 layer. Water contact angle on the thin films was measured by a contact angle analyzer under UV light irradiation. The photocatalytic performance of the TiO2 and SiO2/TiO2 thin films was studied by the degradation of methylene blue under UV irradiation. The effect of an intermediate SiO2 layer on the photocatalytic performance of TiO2 thin films was examined. SiO2/TiO2 double layer thin films showed enhanced photocatalytic activity towards methylene blue dye.

AB - Transparent antireflective SiO2/TiO2 double layer thin films were prepared using a sol–gel method and deposited on glass substrate by spin coating technique. Thin films were characterized using XRD, FE-SEM, AFM, UV–Vis spectroscopy and water contact angle measurements. XRD analysis reveals that the existence of pure anatase phase TiO2 crystallites in the thin films. FE-SEM analysis confirms the homogeneous dispersion of TiO2 on SiO2 layer. Water contact angle on the thin films was measured by a contact angle analyzer under UV light irradiation. The photocatalytic performance of the TiO2 and SiO2/TiO2 thin films was studied by the degradation of methylene blue under UV irradiation. The effect of an intermediate SiO2 layer on the photocatalytic performance of TiO2 thin films was examined. SiO2/TiO2 double layer thin films showed enhanced photocatalytic activity towards methylene blue dye.

UR - http://www.scopus.com/inward/record.url?scp=84988030210&partnerID=8YFLogxK

U2 - 10.1007/s10854-016-5082-4

DO - 10.1007/s10854-016-5082-4

M3 - Article

AN - SCOPUS:84988030210

SN - 0957-4522

VL - 27

SP - 10082

EP - 10088

JO - Journal of Materials Science: Materials in Electronics

JF - Journal of Materials Science: Materials in Electronics

IS - 10

ER -

Fabrication of SiO₂/TiO₂ double layer thin films with self-cleaning and photocatalytic properties

Abstract

Access to Document

Other files and links

Fingerprint

Cite this