Far-infrared study of substrate-effect on large scale graphene

Joo Youn Kim, Chul Lee, Sukang Bae, Keun Soo Kim, Byung Hee Hong, E. J. Choi

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66 Scopus citations

Abstract

From far-IR Drude absorption measurement we determine carrier density (N) and carrier scattering rate (F) of graphene deposited on buffer-layer/ SiO 2 composite substrate. Two types of buffer-layers, (1) polar dielectric oxide ZnO and SrTiO3 (2) organic thin film hexamethyldisilazane and polymethyl methacrylate (PMMA) were studied. N varies widely over 0.12-11.8 (× 1012 cm-2) range depending on the buffer-layer. In contrast remains almost constant, ∼100 cm-1, irrespective of the buffer-layers. This indicates that carrier mobility (μ) of graphene depends on substrate through N, but not by as commonly believed.

Original languageEnglish
Article number201907
JournalApplied Physics Letters
Volume98
Issue number20
DOIs
StatePublished - 16 May 2011

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