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Fluoroalkylated tin-oxo nano clusters as resist candidates for extreme UV lithography
Yejin Ku, Hyungju Ahn, Jin Kyun Lee, Jiho Kim, Byeong Gyu Park, Sangsul Lee, Yu Ha Jang, Byung Jun Jung, Chawon Koh, Tsunehiro Nishi, Hyun Woo Kim
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
1
Scopus
citations