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Gate insulator inhomogeneity in thin film transistors having a polycrystalline silicon layer prepared directly by catalytic chemical vapor deposition at a low temperature

  • Hyun Jun Cho
  • , Wan Shick Hong
  • , Sung Hyun Lee
  • , Tae Hwan Kim
  • , Kyung Min Lee
  • , Kyung Bae Park
  • , Ji Sim Jung
  • , Jang Yeon Kwon
  • University of Seoul
  • Samsung

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

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