High transmittance SiC membrane prepared by electron cyclotron resonance plasma chemical vapor deposition in combination with rapid thermal annealing

Material Science

• Film 100%
• Membrane 100%
• Chemical Vapor Deposition 100%
• Annealing 100%
• Gas 66%
• Residual Stress 66%
• Temperature 33%
• Microstructure 33%
• Transmission Electron Microscopy 33%
• Particle 33%
• Elastic Moduli 33%
• Thin Films 33%
• Physical Property 33%
• Crystalline Material 33%
• Chemical Property 33%
• Ultimate Tensile Strength 33%
• Amorphous Material 33%
• X Ray Diffraction Analysis 33%
• Protective Atmosphere 33%

Engineering

• Membrane 100%
• Chemical Vapor Deposition 100%
• Vapor Deposition 100%
• Rapid Thermal Annealing 100%
• CH4 66%
• Deposition Condition 33%
• Microstructure 33%
• Transmissions 33%
• Wavelength 33%
• Young's Modulus 33%
• Thin Films 33%
• X-Ray Diffraction Analysis 33%
• Tensile Stress σ 33%
• Microwave 33%
• Vapor Deposition Method 33%
• Deposited Film 33%