High transmittance TFT-LCD panels using low-k CVD films

Wan Shick Hong, Kwan Wook Jung, Joon Hoo Choi, Byung Keun Hwang, Kyuha Chung

Research output: Contribution to journalLetterpeer-review

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Thin-film transistor liquid crystal display (TFT-LCD) panels of a high transmittance structure were fabricated by using a low-k dielectric film as a passivation layer. The low-dielectric films were successfully deposited and patterned using a conventional plasma-enhanced chemical vapor deposition (PECVD) and plasma-assisted etching techniques. The interface between the a-Si channel and the overlaying passivation was modified by appropriate plasma treatment prior to the low-k deposition. TFTs having the a-Si:C:O:H passivation showed a transfer characteristics similar to that of conventional TFTs. The high transmittance panel showed brightness approximately 30% higher than that of a standard panel without degrading other display characteristics, such as crosstalk.

Original languageEnglish
Pages (from-to)381-383
Number of pages3
JournalIEEE Electron Device Letters
Issue number6
StatePublished - Jun 2004


  • Aperture ratio
  • Dielectric constant
  • Passivation


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