Hybrid integration of GaAs/AlGaAs in-plane-gate resonant tunneling and field effect transistors

S. H. Son, M. G. Kang, S. W. Hwang, J. I. Lee, Y. J. Park, Y. S. Yu, D. Ahn

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

We report the fabrication and characterization of a planar-type resonant tunneling device-field effect transistor (RTD-FET) hybrid circuit. Our hybrid circuit utilizes in-plane-type gates, which can control the potential of the quantum RTD quantum dot (QD) and FET channel. Transport measurements through the fabricated RTD-FET hybrid circuit exhibited the shift of the negative differential resistance peaks both as functions of the RTD gate and the FET gate. The slope of the current contour plot showed that the coupling capacitance of the FET gate to the QD is 1/20 of that of the FET gate. Our hybrid circuit successfully showed multi-valued inverter characteristics.

Original languageEnglish
Pages (from-to)2160-2162
Number of pages3
JournalPhysica E: Low-Dimensional Systems and Nanostructures
Volume40
Issue number6
DOIs
StatePublished - Apr 2008

Keywords

  • Hybrid circuit
  • In-plane gate
  • Negative differential resistance
  • Quantum dot

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