Abstract
The effect of room temperature oxidation on light scattering by copper particles deposited on a silicon wafer was analyzed. The results show that the room temperaturature oxidation of copper particles proceeds in a continuous manner. The results demonstrated the method of light scattering as a means for measuring the thickness of particle coatings. Excellent agreement was obtained between light scattering measurements and transmission electron microscope (TEM) images.
Original language | English |
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Pages (from-to) | 1278-1280 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 84 |
Issue number | 8 |
DOIs | |
State | Published - 23 Feb 2004 |