Influence of particle oxide coating on light scattering by submicron metal particles on silicon wafers

Jung Hyeun Kim; Sheryl H. Ehrman; Thomas A. Germer

doi:10.1063/1.1650555

Influence of particle oxide coating on light scattering by submicron metal particles on silicon wafers

Jung Hyeun Kim, Sheryl H. Ehrman, Thomas A. Germer

Department of Chemical Engineering

Research output: Contribution to journal › Article › peer-review

67 Scopus citations

Abstract

The effect of room temperature oxidation on light scattering by copper particles deposited on a silicon wafer was analyzed. The results show that the room temperaturature oxidation of copper particles proceeds in a continuous manner. The results demonstrated the method of light scattering as a means for measuring the thickness of particle coatings. Excellent agreement was obtained between light scattering measurements and transmission electron microscope (TEM) images.

Original language	English
Pages (from-to)	1278-1280
Number of pages	3
Journal	Applied Physics Letters
Volume	84
Issue number	8
DOIs	https://doi.org/10.1063/1.1650555
State	Published - 23 Feb 2004

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title = "Influence of particle oxide coating on light scattering by submicron metal particles on silicon wafers",

abstract = "The effect of room temperature oxidation on light scattering by copper particles deposited on a silicon wafer was analyzed. The results show that the room temperaturature oxidation of copper particles proceeds in a continuous manner. The results demonstrated the method of light scattering as a means for measuring the thickness of particle coatings. Excellent agreement was obtained between light scattering measurements and transmission electron microscope (TEM) images.",

author = "Kim, \{Jung Hyeun\} and Ehrman, \{Sheryl H.\} and Germer, \{Thomas A.\}",

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AU - Ehrman, Sheryl H.

AU - Germer, Thomas A.

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Y1 - 2004/2/23

N2 - The effect of room temperature oxidation on light scattering by copper particles deposited on a silicon wafer was analyzed. The results show that the room temperaturature oxidation of copper particles proceeds in a continuous manner. The results demonstrated the method of light scattering as a means for measuring the thickness of particle coatings. Excellent agreement was obtained between light scattering measurements and transmission electron microscope (TEM) images.

AB - The effect of room temperature oxidation on light scattering by copper particles deposited on a silicon wafer was analyzed. The results show that the room temperaturature oxidation of copper particles proceeds in a continuous manner. The results demonstrated the method of light scattering as a means for measuring the thickness of particle coatings. Excellent agreement was obtained between light scattering measurements and transmission electron microscope (TEM) images.

UR - https://www.scopus.com/pages/publications/1642319479

U2 - 10.1063/1.1650555

DO - 10.1063/1.1650555

M3 - Article

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SN - 0003-6951

VL - 84

SP - 1278

EP - 1280

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 8

ER -

Influence of particle oxide coating on light scattering by submicron metal particles on silicon wafers

Abstract

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