Ion scattering spectroscopy study of Si(001)c(4 x 4)-C surface reconstruction

J. Y. Park, J. H. Seo, J. Y. Kim, C. N. Whang, S. S. Kim, D. S. Choi, K. H. Chae

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1 Scopus citations

Abstract

Reconstructed Si(001)c(4 x 4)-C surface has been studied by coaxial impact collision ion scattering spectroscopy (CAICISS). When 100L ethylene (C 2H4) was exposed on Si(001)-(2 x 1) surface at 700°C, Si(001) dimer structures were changed by induced carbon (C) atoms. The experimental CAICISS spectra and simulation results reveal that the reconstructed Si(001)c(4 x 4)-C surface shows good agreement with the missing dimer model, rather than the Si-C heterodimer model, and adsorbed C atoms influence only the reconstructed vertical plane of Si(001) surface. On comparing the azimuthal-scan curves for 100L C/Si(001) with those for clean Si(001), it can be suggested that C atoms occupy the fourth subsurface layer of Si(001) directly below the HB (bridge) site. These results are new evidence supporting the previous studies based on the C incorporation into Si(001) surface with missing dimers and the substitution of the fourth Si layers.

Original languageEnglish
Pages (from-to)614-618
Number of pages5
JournalJournal of the Korean Physical Society
Volume45
Issue number3
StatePublished - Sep 2004

Keywords

  • Carbon
  • Low-energy ion scattering (LEIS)
  • Reconstruction
  • Silicon
  • Surface structure

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