Micromachined planar probe using half-SIW and half-shielded stripline structure for permittivity measurement

Yong Seung Bang; Namgon Kim; Jung Mu Kim; Changyul Cheon; Youngwoo Kwon; Yong Kweon Kim

doi:10.1109/NANO.2010.5697874

Micromachined planar probe using half-SIW and half-shielded stripline structure for permittivity measurement

Yong Seung Bang, Namgon Kim, Jung Mu Kim, Changyul Cheon, Youngwoo Kwon, Yong Kweon Kim

School of Electrical and Computer Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

2 Scopus citations

Abstract

This paper reports on a micromachined planar type probe based on a novel hybrid shielded stripline. The proposed structure is for a broadband transverse electromagnetic (TEM) single-mode propagation using substrate integrated waveguide (SIW) and conventional shielded stripline. We suggested a novel probe structure that composed of half-SIW and half-shielded stripline, which combined through a benzocyclobutene (BCB) bonding layer. The structural concept and simple fabrication method has been introduced, and the S₁₁ in air was measured from 0.5 GHz to 30 GHz. The permittivity measurement of 0.9 % saline has been performed to validate the proposed structure at frequencies from 0.5 GHz to 20 GHz.

Original language	English
Title of host publication	2010 10th IEEE Conference on Nanotechnology, NANO 2010
Pages	1121-1124
Number of pages	4
DOIs	https://doi.org/10.1109/NANO.2010.5697874
State	Published - 2010
Event	2010 10th IEEE Conference on Nanotechnology, NANO 2010 - Ilsan, Gyeonggi-Do, Korea, Republic of Duration: 17 Aug 2010 → 20 Aug 2010

Publication series

Name	2010 10th IEEE Conference on Nanotechnology, NANO 2010

Conference

Conference	2010 10th IEEE Conference on Nanotechnology, NANO 2010
Country/Territory	Korea, Republic of
City	Ilsan, Gyeonggi-Do
Period	17/08/10 → 20/08/10

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10.1109/NANO.2010.5697874

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Bang, Y. S., Kim, N., Kim, J. M., Cheon, C., Kwon, Y., & Kim, Y. K. (2010). Micromachined planar probe using half-SIW and half-shielded stripline structure for permittivity measurement. In 2010 10th IEEE Conference on Nanotechnology, NANO 2010 (pp. 1121-1124). Article 5697874 (2010 10th IEEE Conference on Nanotechnology, NANO 2010). https://doi.org/10.1109/NANO.2010.5697874

@inproceedings{ac049462fe7f4ab3ac8c651e9ad62128,

title = "Micromachined planar probe using half-SIW and half-shielded stripline structure for permittivity measurement",

abstract = "This paper reports on a micromachined planar type probe based on a novel hybrid shielded stripline. The proposed structure is for a broadband transverse electromagnetic (TEM) single-mode propagation using substrate integrated waveguide (SIW) and conventional shielded stripline. We suggested a novel probe structure that composed of half-SIW and half-shielded stripline, which combined through a benzocyclobutene (BCB) bonding layer. The structural concept and simple fabrication method has been introduced, and the S11 in air was measured from 0.5 GHz to 30 GHz. The permittivity measurement of 0.9 % saline has been performed to validate the proposed structure at frequencies from 0.5 GHz to 20 GHz.",

author = "Bang, {Yong Seung} and Namgon Kim and Kim, {Jung Mu} and Changyul Cheon and Youngwoo Kwon and Kim, {Yong Kweon}",

year = "2010",

doi = "10.1109/NANO.2010.5697874",

language = "English",

isbn = "9781424470334",

series = "2010 10th IEEE Conference on Nanotechnology, NANO 2010",

pages = "1121--1124",

booktitle = "2010 10th IEEE Conference on Nanotechnology, NANO 2010",

note = "2010 10th IEEE Conference on Nanotechnology, NANO 2010 ; Conference date: 17-08-2010 Through 20-08-2010",

}

Bang, YS, Kim, N, Kim, JM, Cheon, C, Kwon, Y & Kim, YK 2010, Micromachined planar probe using half-SIW and half-shielded stripline structure for permittivity measurement. in 2010 10th IEEE Conference on Nanotechnology, NANO 2010., 5697874, 2010 10th IEEE Conference on Nanotechnology, NANO 2010, pp. 1121-1124, 2010 10th IEEE Conference on Nanotechnology, NANO 2010, Ilsan, Gyeonggi-Do, Korea, Republic of, 17/08/10. https://doi.org/10.1109/NANO.2010.5697874

Micromachined planar probe using half-SIW and half-shielded stripline structure for permittivity measurement. / Bang, Yong Seung; Kim, Namgon; Kim, Jung Mu et al.
2010 10th IEEE Conference on Nanotechnology, NANO 2010. 2010. p. 1121-1124 5697874 (2010 10th IEEE Conference on Nanotechnology, NANO 2010).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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T1 - Micromachined planar probe using half-SIW and half-shielded stripline structure for permittivity measurement

AU - Bang, Yong Seung

AU - Kim, Namgon

AU - Kim, Jung Mu

AU - Cheon, Changyul

AU - Kwon, Youngwoo

AU - Kim, Yong Kweon

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Y1 - 2010

N2 - This paper reports on a micromachined planar type probe based on a novel hybrid shielded stripline. The proposed structure is for a broadband transverse electromagnetic (TEM) single-mode propagation using substrate integrated waveguide (SIW) and conventional shielded stripline. We suggested a novel probe structure that composed of half-SIW and half-shielded stripline, which combined through a benzocyclobutene (BCB) bonding layer. The structural concept and simple fabrication method has been introduced, and the S11 in air was measured from 0.5 GHz to 30 GHz. The permittivity measurement of 0.9 % saline has been performed to validate the proposed structure at frequencies from 0.5 GHz to 20 GHz.

AB - This paper reports on a micromachined planar type probe based on a novel hybrid shielded stripline. The proposed structure is for a broadband transverse electromagnetic (TEM) single-mode propagation using substrate integrated waveguide (SIW) and conventional shielded stripline. We suggested a novel probe structure that composed of half-SIW and half-shielded stripline, which combined through a benzocyclobutene (BCB) bonding layer. The structural concept and simple fabrication method has been introduced, and the S11 in air was measured from 0.5 GHz to 30 GHz. The permittivity measurement of 0.9 % saline has been performed to validate the proposed structure at frequencies from 0.5 GHz to 20 GHz.

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T3 - 2010 10th IEEE Conference on Nanotechnology, NANO 2010

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BT - 2010 10th IEEE Conference on Nanotechnology, NANO 2010

T2 - 2010 10th IEEE Conference on Nanotechnology, NANO 2010

Y2 - 17 August 2010 through 20 August 2010

ER -

Micromachined planar probe using half-SIW and half-shielded stripline structure for permittivity measurement

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