Microstrip gas chambers on glass and ceramic substrates

W. G. Gong; H. Wieman; J. W. Harris; J. T. Mitchell; W. S. Hong; V. Perez-Mendez

doi:10.1109/23.322827

Microstrip gas chambers on glass and ceramic substrates

W. G. Gong, H. Wieman, J. W. Harris, J. T. Mitchell, W. S. Hong, V. Perez-Mendez

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

We report developments of Microstrip Gas Chambers (MSGC) fabricated on glass and ceramic substrates with various resistivities. Low resistivity of the substrate is found to be critical for achieving stable operation of microstrip gas chambers. The microstrip pattern consists of 10 µm wide anodes and 90 µm wide cathodes with a 200 µm anode-to-anode pitch. High-quality microstrips are fabricated using the dry etch after UV-photolithography. Our chambers are tested in an Ar(90)-CH4(10) gas mixture at atmospheric pressure with a 100 µCi55Fe source. An energy resolution (FWHM) of 15% has been achieved for 6 keV soft Xrays. At a rate of 5×104 photons/sec/mm2, gas gains are stable within a few percent.

Original language	English
Pages (from-to)	890-897
Number of pages	8
Journal	IEEE Transactions on Nuclear Science
Volume	41
Issue number	4
DOIs	https://doi.org/10.1109/23.322827
State	Published - Aug 1994

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title = "Microstrip gas chambers on glass and ceramic substrates",

abstract = "We report developments of Microstrip Gas Chambers (MSGC) fabricated on glass and ceramic substrates with various resistivities. Low resistivity of the substrate is found to be critical for achieving stable operation of microstrip gas chambers. The microstrip pattern consists of 10 µm wide anodes and 90 µm wide cathodes with a 200 µm anode-to-anode pitch. High-quality microstrips are fabricated using the dry etch after UV-photolithography. Our chambers are tested in an Ar(90)-CH4(10) gas mixture at atmospheric pressure with a 100 µCi55Fe source. An energy resolution (FWHM) of 15% has been achieved for 6 keV soft Xrays. At a rate of 5×104 photons/sec/mm2, gas gains are stable within a few percent.",

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AU - Gong, W. G.

AU - Wieman, H.

AU - Harris, J. W.

AU - Mitchell, J. T.

AU - Hong, W. S.

AU - Perez-Mendez, V.

PY - 1994/8

Y1 - 1994/8

N2 - We report developments of Microstrip Gas Chambers (MSGC) fabricated on glass and ceramic substrates with various resistivities. Low resistivity of the substrate is found to be critical for achieving stable operation of microstrip gas chambers. The microstrip pattern consists of 10 µm wide anodes and 90 µm wide cathodes with a 200 µm anode-to-anode pitch. High-quality microstrips are fabricated using the dry etch after UV-photolithography. Our chambers are tested in an Ar(90)-CH4(10) gas mixture at atmospheric pressure with a 100 µCi55Fe source. An energy resolution (FWHM) of 15% has been achieved for 6 keV soft Xrays. At a rate of 5×104 photons/sec/mm2, gas gains are stable within a few percent.

AB - We report developments of Microstrip Gas Chambers (MSGC) fabricated on glass and ceramic substrates with various resistivities. Low resistivity of the substrate is found to be critical for achieving stable operation of microstrip gas chambers. The microstrip pattern consists of 10 µm wide anodes and 90 µm wide cathodes with a 200 µm anode-to-anode pitch. High-quality microstrips are fabricated using the dry etch after UV-photolithography. Our chambers are tested in an Ar(90)-CH4(10) gas mixture at atmospheric pressure with a 100 µCi55Fe source. An energy resolution (FWHM) of 15% has been achieved for 6 keV soft Xrays. At a rate of 5×104 photons/sec/mm2, gas gains are stable within a few percent.

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Microstrip gas chambers on glass and ceramic substrates

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