Modeling of Channel Current in Sub-threshold Region for Poly-Si based Macaroni Structure in 3D NAND Flash Memories

Juhyun Kim, Ilho Myeong, Minsoo Kim, Sungbak Kim, Myounggon Kang, Jongwook Jeon, Hyungcheol Shin

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In this paper, sub-threshold region I-V model for poly-Si based macaroni structure in 3D NAND Flash memories is presented. The model is based on analytical I-V solution for macaroni structure which was previously developed for single crystal-Si channel. Starting from the existing model, the characteristics of polysilicon, such as sub-threshold slope (S.S.) and mobility degradation and drain induced barrier lowering (DIBL), were added. Moreover, we considered shift in I-V curve due to different distribution of traps for each cell.

Original languageEnglish
Title of host publication2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages200-202
Number of pages3
ISBN (Electronic)9781538665084
DOIs
StatePublished - Mar 2019
Event2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019 - Singapore, Singapore
Duration: 12 Mar 201915 Mar 2019

Publication series

Name2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019

Conference

Conference2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019
Country/TerritorySingapore
CitySingapore
Period12/03/1915/03/19

Keywords

  • macaroni structure
  • mobility and DIBL
  • polysilicon characteristics
  • S.S.

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