Modellierung von Nanopartikel-Kontamination auf kritischen Oberflächen in der Halbleiterindustrie

Translated title of the contribution: Modeling of nanoparticle contamination on critical surfaces in the semiconductor industry

C. Asbach, J. H. Kim, S. J. Yook, D. Y.H. Pui, T. Engelke, H. Fissan, T. Van Der Zwaag

Research output: Contribution to specialist publication › Article

Translated title of the contribution	Modeling of nanoparticle contamination on critical surfaces in the semiconductor industry
Original language	German
Pages	1216
Number of pages	1
Volume	77
No	8
Specialist publication	Chemie-Ingenieur-Technik
DOIs	https://doi.org/10.1002/cite.200580036
State	Published - Aug 2005

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title = "Modellierung von Nanopartikel-Kontamination auf kritischen Oberfl{\"a}chen in der Halbleiterindustrie",

author = "C. Asbach and Kim, {J. H.} and Yook, {S. J.} and Pui, {D. Y.H.} and T. Engelke and H. Fissan and {Van Der Zwaag}, T.",

year = "2005",

month = aug,

doi = "10.1002/cite.200580036",

language = "German",

volume = "77",

pages = "1216",

journal = "Chemie-Ingenieur-Technik",

issn = "0009-286X",

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AU - Yook, S. J.

AU - Pui, D. Y.H.

AU - Engelke, T.

AU - Fissan, H.

AU - Van Der Zwaag, T.

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JO - Chemie-Ingenieur-Technik

JF - Chemie-Ingenieur-Technik

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