Modellierung von Nanopartikel-Kontamination auf kritischen Oberflächen in der Halbleiterindustrie

Translated title of the contribution: Modeling of nanoparticle contamination on critical surfaces in the semiconductor industry

Research output: Contribution to specialist publication › Article

Translated title of the contribution	Modeling of nanoparticle contamination on critical surfaces in the semiconductor industry
Original language	German
Pages	1216
Number of pages	1
Volume	77
No	8
Specialist publication	Chemie-Ingenieur-Technik
DOIs	https://doi.org/10.1002/cite.200580036
State	Published - Aug 2005

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title = "Modellierung von Nanopartikel-Kontamination auf kritischen Oberfl{\"a}chen in der Halbleiterindustrie",

author = "C. Asbach and Kim, \{J. H.\} and Yook, \{S. J.\} and Pui, \{D. Y.H.\} and T. Engelke and H. Fissan and \{Van Der Zwaag\}, T.",

year = "2005",

month = aug,

doi = "10.1002/cite.200580036",

language = "German",

volume = "77",

pages = "1216",

journal = "Chemie-Ingenieur-Technik",

issn = "0009-286X",

publisher = "John Wiley and Sons Inc.",

}

TY - GEN

T1 - Modellierung von Nanopartikel-Kontamination auf kritischen Oberflächen in der Halbleiterindustrie

AU - Asbach, C.

AU - Kim, J. H.

AU - Yook, S. J.

AU - Pui, D. Y.H.

AU - Engelke, T.

AU - Fissan, H.

AU - Van Der Zwaag, T.

PY - 2005/8

Y1 - 2005/8

UR - https://www.scopus.com/pages/publications/28244467444

U2 - 10.1002/cite.200580036

DO - 10.1002/cite.200580036

M3 - Article

AN - SCOPUS:28244467444

SN - 0009-286X

VL - 77

SP - 1216

JO - Chemie-Ingenieur-Technik

JF - Chemie-Ingenieur-Technik

ER -