Modellierung von Nanopartikel-Kontamination auf kritischen Oberflächen in der Halbleiterindustrie

Translated title of the contribution: Modeling of nanoparticle contamination on critical surfaces in the semiconductor industry

C. Asbach, J. H. Kim, S. J. Yook, D. Y.H. Pui, T. Engelke, H. Fissan, T. Van Der Zwaag

Research output: Contribution to specialist publication › Article

Translated title of the contribution	Modeling of nanoparticle contamination on critical surfaces in the semiconductor industry
Original language	German
Pages	1216
Number of pages	1
Volume	77
No	8
Specialist publication	Chemie-Ingenieur-Technik
DOIs	https://doi.org/10.1002/cite.200580036
State	Published - Aug 2005

Access to Document

@misc{1fdada0fc526430099ff87a0f8f57359,

title = "Modellierung von Nanopartikel-Kontamination auf kritischen Oberfl{\"a}chen in der Halbleiterindustrie",

author = "C. Asbach and Kim, \{J. H.\} and Yook, \{S. J.\} and Pui, \{D. Y.H.\} and T. Engelke and H. Fissan and \{Van Der Zwaag\}, T.",

year = "2005",

month = aug,

doi = "10.1002/cite.200580036",

language = "German",

volume = "77",

pages = "1216",

journal = "Chemie-Ingenieur-Technik",

issn = "0009-286X",

publisher = "John Wiley and Sons Inc.",

}

TY - GEN

T1 - Modellierung von Nanopartikel-Kontamination auf kritischen Oberflächen in der Halbleiterindustrie

AU - Asbach, C.

AU - Kim, J. H.

AU - Yook, S. J.

AU - Pui, D. Y.H.

AU - Engelke, T.

AU - Fissan, H.

AU - Van Der Zwaag, T.

PY - 2005/8

Y1 - 2005/8

UR - https://www.scopus.com/pages/publications/28244467444

U2 - 10.1002/cite.200580036

DO - 10.1002/cite.200580036

M3 - Article

AN - SCOPUS:28244467444

SN - 0009-286X

VL - 77

SP - 1216

JO - Chemie-Ingenieur-Technik

JF - Chemie-Ingenieur-Technik

ER -