Skip to main navigation Skip to search Skip to main content

Nanocrystalline silicon films deposited with a modulated hydrogen dilution ratio by catalytic CVD at 200 °C

  • University of Seoul

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Fingerprint

Dive into the research topics of 'Nanocrystalline silicon films deposited with a modulated hydrogen dilution ratio by catalytic CVD at 200 °C'. Together they form a unique fingerprint.
Sort by

Engineering

Material Science