Nanofabrication of quantum dots on InP by In-situ etching and selective growth

Y. Huang, T. Kim, T. Garrod, L. J. Mawst, S. Xiong, P. F. Nealey, K. Schulte, T. F. Kuech

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Diblock copolymer lithography followed by selective growth is used for the nanofabrication of InGaAs quantum dots (QDs) on InP substrate. Stronger photoluminescence intensity is observed when in-situ CBr4 etching is employed prior to QD growth.

Original languageEnglish
Title of host publicationCLEO
Subtitle of host publicationScience and Innovations, CLEO_SI 2012
PublisherOptical Society of America (OSA)
PagesCTu2J.8
ISBN (Print)9781557529435
DOIs
StatePublished - 2012
EventCLEO: Science and Innovations, CLEO_SI 2012 - San Jose, CA, United States
Duration: 6 May 201211 May 2012

Publication series

NameCLEO: Science and Innovations, CLEO_SI 2012

Conference

ConferenceCLEO: Science and Innovations, CLEO_SI 2012
Country/TerritoryUnited States
CitySan Jose, CA
Period6/05/1211/05/12

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