Novel MMIC protection technique in plasma etching process for mechanically movable RF mems antenna

In this article, we proposed the novel monolithic microwave integrated circuit (MMIC) protection technique in plasma etching process for MMIC mounted mechanically movable RF MEMS antenna. We could eliminate the distortion of radiation pattern caused by RF feed line on antenna frame and torsional hinge as using MMIC direct mounting on antenna plate instead of using external RF power source. Silicon-based mechanically movable RF MEMS antenna was released using DRIE process, which was performed on the backside of silicon substrate after MMIC mounting on RF MEMS antenna plate. An aluminum layer on the front side of RF MEMS antenna plays a role of etch stop layer for DRIE process. We measured the radiation pattern as rotating the moving plate along the vertical- and horizontal-direction hinge mechanically. We could obtain the radiation pattern without gain reduction and distortion of radiation pattern.