P-93: Silicon nanocrystals embedded in silicon-rich silicon nitride films for application of light emitting diodes in flexible display

Kyoung Min Lee; Wan Shick Hong; Jae Dam Hwang; Youn Jin Lee; Kil Sun No

doi:10.1889/1.3500031

P-93: Silicon nanocrystals embedded in silicon-rich silicon nitride films for application of light emitting diodes in flexible display

Kyoung Min Lee
, Wan Shick Hong
, Jae Dam Hwang
, Youn Jin Lee
, Kil Sun No

Department of Materials Science and Engineering

University of Seoul

Research output: Contribution to journal › Article › peer-review

Abstract

The silicon nanocrystals embedded in silicon-rich silicon nitride films were deposited by catalytic CVD at low temperature (≤200°C). Excimer laser annealing and in-situ H₂ treatment were performed to increase quantum efficiency. Electrical properties of metal-insulator-semiconductor structures using these samples were measured.

Original language	English
Pages (from-to)	1595-1598
Number of pages	4
Journal	Digest of Technical Papers - SID International Symposium
Volume	41 1
DOIs	https://doi.org/10.1889/1.3500031
State	Published - May 2010

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@article{328a13867f0040d9a78032fbf940f067,

title = "P-93: Silicon nanocrystals embedded in silicon-rich silicon nitride films for application of light emitting diodes in flexible display",

abstract = "The silicon nanocrystals embedded in silicon-rich silicon nitride films were deposited by catalytic CVD at low temperature (≤200°C). Excimer laser annealing and in-situ H2 treatment were performed to increase quantum efficiency. Electrical properties of metal-insulator-semiconductor structures using these samples were measured.",

author = "Lee, \{Kyoung Min\} and Hong, \{Wan Shick\} and Hwang, \{Jae Dam\} and Lee, \{Youn Jin\} and No, \{Kil Sun\}",

year = "2010",

month = may,

doi = "10.1889/1.3500031",

language = "English",

volume = "41 1",

pages = "1595--1598",

journal = "Digest of Technical Papers - SID International Symposium",

issn = "0097-966X",

publisher = "John Wiley and Sons Inc.",

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T2 - Silicon nanocrystals embedded in silicon-rich silicon nitride films for application of light emitting diodes in flexible display

AU - Lee, Kyoung Min

AU - Hong, Wan Shick

AU - Hwang, Jae Dam

AU - Lee, Youn Jin

AU - No, Kil Sun

PY - 2010/5

Y1 - 2010/5

N2 - The silicon nanocrystals embedded in silicon-rich silicon nitride films were deposited by catalytic CVD at low temperature (≤200°C). Excimer laser annealing and in-situ H2 treatment were performed to increase quantum efficiency. Electrical properties of metal-insulator-semiconductor structures using these samples were measured.

AB - The silicon nanocrystals embedded in silicon-rich silicon nitride films were deposited by catalytic CVD at low temperature (≤200°C). Excimer laser annealing and in-situ H2 treatment were performed to increase quantum efficiency. Electrical properties of metal-insulator-semiconductor structures using these samples were measured.

UR - https://www.scopus.com/pages/publications/84863331274

U2 - 10.1889/1.3500031

DO - 10.1889/1.3500031

M3 - Article

AN - SCOPUS:84863331274

SN - 0097-966X

VL - 41 1

SP - 1595

EP - 1598

JO - Digest of Technical Papers - SID International Symposium

JF - Digest of Technical Papers - SID International Symposium

ER -

P-93: Silicon nanocrystals embedded in silicon-rich silicon nitride films for application of light emitting diodes in flexible display

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