Photolithographic Micropatterning of an Electroluminescent Polymer Using Photobase Generator

Sang Kyun Lee; Byung Jun Jung; Taek Ahn; Insung Song; Hong Ku Shim

doi:10.1021/ma034928y

Photolithographic Micropatterning of an Electroluminescent Polymer Using Photobase Generator

Sang Kyun Lee, Byung Jun Jung, Taek Ahn, Insung Song, Hong Ku Shim

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

24 Scopus citations

Abstract

Photolithographic micropatterning method was described for conjugated polymer using photobase generator (PBG). The patterned emission image of photopatternable polymer fabricated by the photolithographic method was displayed. The photochemical cleavage of the photosensitive protecting groups was illustrated. The infrared spectra of thermally eliminated and photopatternable polymers with PBG showed the strong absorption at 961 cm ^-1 in comparison to the halo-precursor polymer.

Original language	English
Pages (from-to)	9252-9256
Number of pages	5
Journal	Macromolecules
Volume	36
Issue number	24
DOIs	https://doi.org/10.1021/ma034928y
State	Published - 2 Dec 2003

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title = "Photolithographic Micropatterning of an Electroluminescent Polymer Using Photobase Generator",

abstract = "Photolithographic micropatterning method was described for conjugated polymer using photobase generator (PBG). The patterned emission image of photopatternable polymer fabricated by the photolithographic method was displayed. The photochemical cleavage of the photosensitive protecting groups was illustrated. The infrared spectra of thermally eliminated and photopatternable polymers with PBG showed the strong absorption at 961 cm -1 in comparison to the halo-precursor polymer.",

author = "Lee, {Sang Kyun} and Jung, {Byung Jun} and Taek Ahn and Insung Song and Shim, {Hong Ku}",

year = "2003",

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T1 - Photolithographic Micropatterning of an Electroluminescent Polymer Using Photobase Generator

AU - Lee, Sang Kyun

AU - Jung, Byung Jun

AU - Ahn, Taek

AU - Song, Insung

AU - Shim, Hong Ku

PY - 2003/12/2

Y1 - 2003/12/2

N2 - Photolithographic micropatterning method was described for conjugated polymer using photobase generator (PBG). The patterned emission image of photopatternable polymer fabricated by the photolithographic method was displayed. The photochemical cleavage of the photosensitive protecting groups was illustrated. The infrared spectra of thermally eliminated and photopatternable polymers with PBG showed the strong absorption at 961 cm -1 in comparison to the halo-precursor polymer.

AB - Photolithographic micropatterning method was described for conjugated polymer using photobase generator (PBG). The patterned emission image of photopatternable polymer fabricated by the photolithographic method was displayed. The photochemical cleavage of the photosensitive protecting groups was illustrated. The infrared spectra of thermally eliminated and photopatternable polymers with PBG showed the strong absorption at 961 cm -1 in comparison to the halo-precursor polymer.

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DO - 10.1021/ma034928y

M3 - Article

AN - SCOPUS:0344253995

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SP - 9252

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JO - Macromolecules

JF - Macromolecules

IS - 24

ER -

Photolithographic Micropatterning of an Electroluminescent Polymer Using Photobase Generator

Abstract

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