Abstract
In this paper, we develop a novel approach to achieve ultra-high resolution in organic light-emitting diodes (OLEDs) through a photolithography patterning process. It is important to apply a solvent resistant electron transport layer (ETL) in the photolithography pattering of OLED because of solution coating process of photoresist on the ETL. Therefore, a solvent resistant ETL named 2,7-bis(4,6-diphenyl-1,3,5-triazin-2-yl)-9,9′-spirobi[fluorene] (SBF-Trz) was developed and employed as the ETL of OLEDs. The SBF-Trz demonstrated excellent solvent resistance during photolithography process and enabled device performances comparable to those of the conventional OLED without any photolithography process. It was found that the SBF-Trz ETL is appropriate as the ETL of the OLED patterned by photolithography due to good electron transport property, good stability, and good solvent resistance.
| Original language | English |
|---|---|
| Pages (from-to) | 2181-2183 |
| Number of pages | 3 |
| Journal | Digest of Technical Papers - SID International Symposium |
| Volume | 55 |
| Issue number | 1 |
| DOIs | |
| State | Published - 2024 |
| Event | International Symposium, Seminar, and Exhibition, Display Week 2024 - San Jose, United States Duration: 12 May 2024 → 17 May 2024 |
Keywords
- Electron Transport Layer (ETL)
- FMM-Free
- Micro display
- Organic light-emitting diodes (OLED)
- Photolithography Patterning
- Reactive Ion Etching (RIE)
- Ultra High resolution